Effect of oxygen plasma exposure of porous spin-on-glass films

Hydrogen-methyl-siloxane-based porous spin-on-glass films were exposed to an oxidative plasma. The plasma exposure resulted in the loss of hydrophobic groups such as Si-H and Si-CH3. The formation of silanole groups, the decrease in film thickness, and moisture uptake were also observed. When the substrate was biased during exposure, these tendencies were found to be suppressed. (C) 2000 American Vacuum Society. [S0734-211X(00)03603-9].