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Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SIC, Mo, Mg2Si, and InSb and of evaporated Cr

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APPLIED OPTICS
卷 39, 期 16, 页码 2772-2781

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OPTICAL SOC AMER
DOI: 10.1364/AO.39.002772

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Reflectance measurements and optical constants of thin films of ion-beam-deposited SiC, Mo, Mg,Si, and InSb and of evaporated Or have been measured in the extreme-ultraviolet (EUV) spectral region from 49.0 to 200.0 nm. In this spectral region no optical constant data were available for materials deposited by ion-beam deposition. We compared our data with those far bulk samples and for thin films prepared by different techniques. The goal of this research has been to study candidate materials far multilayer coatings in the EUV. (C) 2000 Optical Society of America OCIS codes: 120.4530, 120.5700, 230.0310, 260.7210, 260.7200, 310.1620.

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