Fabrication of Nanostructures using a UV-based imprint technique

We present a modified Nn-technique for the fabrication of nm-structures. The approach is based on the photopolymerization of special resists through a quartz mold. The fabrication sequence for the molds as well as requirements and properties of new resist materials are presented. The resists are adapted to the process, making a low pressure and room temperature printing and an easy detachment of the mold possible. Special modification guarantees suitable etching rates and selectivities. With this technique 80% of the mold area was printed with a pressure of only 0.8 bar. Dot arrays with a single dot diameter of 80nm have been printed successfully.