期刊
ACCOUNTS OF CHEMICAL RESEARCH
卷 33, 期 7, 页码 457-466出版社
AMER CHEMICAL SOC
DOI: 10.1021/ar980081s
关键词
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This Account focuses on our recent and systematic effort in the development of generic scanning probe lithography (SPL)-based methodologies to produce nanopatterns of self-assembled mono-layers (SAMs). The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. The approaches used include two AFM-based methods, nanoshaving and nanografting, which rely on the local force, and two STM-based techniques, electron-induced diffusion and desorption, which use tunneling electrons for fabrication. In this Account we discuss the principle of these procedures and the critical steps in controlling local tip-surface interactions. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns and their potential applications.
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