期刊
PHYSICAL REVIEW LETTERS
卷 85, 期 13, 页码 2733-2736出版社
AMERICAN PHYSICAL SOC
DOI: 10.1103/PhysRevLett.85.2733
关键词
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Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N-2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.
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