期刊
JOURNAL OF PHYSICAL CHEMISTRY B
卷 104, 期 38, 页码 9038-9043出版社
AMER CHEMICAL SOC
DOI: 10.1021/jp001568x
关键词
-
A thin film of copper(I) oxide (thickness similar to 9 Angstrom), grown on a Cu(III) crystal, was used as a model photocatalyst for decomposition of D2O using ultraviolet light (hv 1.55-6.21 eV). No evidence for water photosplitting was observed. The experimental uncertainties establish an upper limit of 2 x 10(-21) cm(2) for the cross section of the photoprocess sought. The pure Cu2O film was grown by bombardment with O-2(+) ions (1.5 kV) at a sample temperature of 605 K and was characterized by Auger electron spectroscopy.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据