Ultraviolet lithography of self-assembled monolayers for submicron patterned deposition

We report on a lithographic technique that uses self-assembled monolayers (SAMs) as a resist to fabricate patterned, chemically functionalized surfaces. Large area line, square, and triangular patterns with a periodicity of 532 nm were generated exposing SAMs of hydrophobic or hydrophilic alkanethiolates to an ultraviolet laser interference pattern at 193 nm for only a few minutes (corresponding to similar to 16 J/cm(2)) followed by the immersion into an alternating thiol. Patterned films of CaCO3, Zn(OH)(2), and polymers were directly deposited on these templates. Using substrates patterned with oppositely charged SAMs, large periodic arrays of charged colloids were fabricated. (C) 2000 American Institute of Physics. [S0003-6951(00)01041-X].