期刊
APPLIED PHYSICS LETTERS
卷 77, 期 18, 页码 2828-2830出版社
AMER INST PHYSICS
DOI: 10.1063/1.1322373
关键词
-
Electron temperature measured by an optical-emission spectroscopy shows a strong substrate temperature dependence in a silane glow-discharge plasma. The electron temperature increases with time after turning on the plasma at a low substrate temperature of 150 degreesC, while it stays constant at a high substrate temperature of 400 degreesC. The electron temperature is drastically reduced when the source gas silane is diluted with hydrogen at low substrate temperatures. These results suggest that the electron temperature in silane plasma is strongly affected by an electron-attachment process to higher-order silane molecules whose formation reactions show negative activation energies with gas temperature and are also suppressed by the presence of hydrogen molecules. (C) 2000 American Institute of Physics. [S0003-6951(00)04744-6].
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据