期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 18, 期 6, 页码 3572-3577出版社
AMER INST PHYSICS
DOI: 10.1116/1.1324618
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We have finished the construction of an automated tool for step and flash imprint lithography. The tool was constructed to allow defect studies by making multiple imprints on a 200 mm wafer. The imprint templates for this study were treated with a low surface energy, self-assembled monolayer to ensure selective release at the template-etch barrier interface. This surface treatment is very durable and survives repeated imprints and multiple aggressive physical and chemical cleanings. The imprint and release forces were measured for a number of successive imprints, and did not change significantly. The process appears to be self-cleaning. Contamination on the template is entrained in the polymerizing liquid, and the number of defects is reduced with repeated imprints. (C) 2000 American Vacuum Society. [S0734-211X(00)16106-2].
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