4.4 Article Proceedings Paper

Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices

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THIN SOLID FILMS
卷 377, 期 -, 页码 798-802

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ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(00)01290-6

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aluminum doped zinc oxide (AZO); transparent conducting oxide (TCO); pulsed laser deposition (PLD); organic light emitting diodes (OLEDs)

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Transparent conducting aluminum-doped zinc oxide (AZO) thin films have been deposited on glass substrates by pulsed laser deposition. The structural, electrical and optical properties of these films were investigated as a function of Al-doping amount (0-4 wt.%) in the target. Films were deposited at a substrate temperature of 200 degreesC in 0.67 Pa of oxygen pressure. It was observed that 0.8-wt.% of Al is the optimum doping amount in the target to achieve the minimum film resistivity and the maximum film transmission. For the 300-nm thick AZO film deposited using a ZnO target with an Al content of 0.8 wt.%, the electrical resistivity was 3.7 x 10(-4) Ohm -cm and the average transmission in the visible range (400-700 nm) was 90%. The AZO films grown by PLD were used as transparent anodes to fabricate organic light-emitting diodes. The device performance was measured and an external quantum efficiency of 0.3% was measured at a current density of 100 A/m(2). (C) 2000 Elsevier Science B.V. All rights reserved.

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