期刊
JOURNAL OF APPLIED PHYSICS
卷 88, 期 11, 页码 6598-6604出版社
AMER INST PHYSICS
DOI: 10.1063/1.1315614
关键词
-
We have grown YMnO3 (YMO) thin films on Si(111) using silicon oxynitride (SiON) as a buffer layer. Thickness of SiON buffer layer was well controlled within 2 nm. High resistance of ultrathin SiON layer (d(SiON)similar to0.7 nm) to Si oxidation was confirmed by x-ray photoelectron spectroscopy (XPS). Using the ultrathin SiON layer, we obtained c-axis oriented ferroelectric phase of YMO. Although capacitance-voltage curves of Al/YMO/SiON/Si(111) showed hystereses attributed to ferroelectricity of the YMO films, the memory window was not sufficient (0.2 V), seemingly due to poor crystallinity of the YMO films. On the other hand, leakage current characteristic was good enough for application. The typical value of leakage current density was 10(-8) A/cm(2) at a drive voltage of +/-5 V. In this article, the details of the characterization elucidated by using x-ray diffraction, atomic force microscopy, and XPS will be shown as well. (C) 2000 American Institute of Physics. [S0021-8979(00)03722-1].
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据