4.6 Article

Grain boundary filtration by selective nucleation and solid phase epitaxy of Ge through planar constrictions

期刊

APPLIED PHYSICS LETTERS
卷 77, 期 26, 页码 4325-4327

出版社

AMER INST PHYSICS
DOI: 10.1063/1.1333682

关键词

-

向作者/读者索取更多资源

We have proposed and experimentally demonstrated a grain boundary filtration technique for unseeded fabrication of single grain semiconductor films on amorphous substrates by using patterned P-doped amorphous Ge films with In-induced selective nucleation and solid phase epitaxy. The patterns consist of a small Ge island seed region including a deposited metal selective nucleation site, a narrow seed region, and a single grain region consisting of a main rectangular island. Transmission electron microscopy revealed lateral epitaxy initiated at the edge of the selective nucleation site and the grain selection process through the narrow seed selection region produced only one grain orientation at the entrance of the main island. Single grain regions as large as 100 mum(2) with only a few low-angle boundaries were formed at 400 degreesC without spontaneous nucleation. (C) 2000 American Institute of Physics. [S0003-6951(00)00152-2].

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据