期刊
APPLIED SURFACE SCIENCE
卷 169, 期 -, 页码 553-556出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S0169-4332(00)00736-4
关键词
LaNiO3 thin film; PZT thin film; ferroelectric thin film; pulsed laser deposition; synchrotron X-ray scattering
The structural characteristics of LaNiO3/Si(0 0 1) films grown by pulsed laser deposition have been studied mainly using a synchrotron X-ray scattering measurement. The films were grown with the (0 0 1) preferred orientation without any alignment in the in-plane direction. The initially unstrained film became strained gradually as it grew further, but its crystalline quality improved significantly. A fully (0 0 1) textured Pb(Zr0.4Ti0.6)O-3 film was successfully grown on such a (0 0 I) textured LaNiO3/Si(0 0 1) substrate as low as 350 degreesC. The nature of structure and microstructure of the Pb(Zr0.4Ti0.6)O-3 film appeared to be similar to that of the underlaying LaNiO3 film. (C) 2001 Elsevier Science B.V. All rights reserved.
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