期刊
JOURNAL OF APPLIED PHYSICS
卷 89, 期 4, 页码 2452-2457出版社
AMER INST PHYSICS
DOI: 10.1063/1.1337592
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A phenomenological model of indium and gallium incorporation in InxGa1-xN thin films grown by molecular beam epitaxy is presented. The group III incorporation rates are hypothesized to vary as different powers of the respective metal surface concentrations. A self-blocking process by indium, such as indium droplet formation, is easily inserted into the model in a meaningful way. A two-parameter expression for x is derived and is in excellent quantitative agreement with experimental observations. Finally, there is evidence that suggests the surface lifetime of indium adatoms varies with substrate temperature as (665 degreesC-T-s)(1/2) for 600 degrees < T-s < 665 degreesC. (C) 2001 American Institute of Physics.
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