Numerical modeling of a microwave plasma CVD reactor

This paper presents the results of numerical simulation of a microwave CVD reactor operating in CW and pulsed regimes. Dependencies of discharge parameters on the hydrogen pressure and microwave power have been studied. The possibility to use the pulse-periodic regime of discharge for deposition of diamond films has been analyzed. It is shown that a pulsed discharge may be used to improve the quality and increase the growth rate of the films. (C) 2001 Elsevier Science B.V. All rights reserved.