期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
卷 19, 期 2, 页码 599-602出版社
AMER INST PHYSICS
DOI: 10.1116/1.1340655
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We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N-2) microdischarge hollow cathode lamp (N-2 MHCL) as a light source of the atomic nitrogen (N) resonance Lines for measuring absolute N densities in process plasmas. The estimations of self-absorption and the emission line profiles of the N-2 MHCL, which are necessary for absolute N density determination, were carried out. The measurement of absolute N densities have been demonstrated for an inductively coupled N-2 plasma using the VUVAS system employing the N2MHCL. (C) 2001 American Vacuum Society.
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