期刊
APPLIED SURFACE SCIENCE
卷 173, 期 1-2, 页码 84-90出版社
ELSEVIER
DOI: 10.1016/S0169-4332(00)00888-6
关键词
thin films; ZrO2; sputtering
Zirconium oxide (ZrO2) films have been prepared by rf reactive magnetron sputtering at different sputtering pressures. It is found that the monoclinic phase is the dominant phase in the films and there is a small fraction of tetragonal phase in the films prepared in the low pressure region. The influence of sputtering pressure on the microstructure. residual stress and optical properties of the films has been studied. The films have been characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM). energy dispersive X-ray (EDX) and optical spectroscopy. (C) 2001 Elsevier Science B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据