Entangled-state lithography:: Tailoring any pattern with a single state

We demonstrate a systematic approach to Heisenberg-Limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N + 1) X (N + 1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.