期刊
JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 34, 期 11, 页码 1675-1677出版社
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/34/11/318
关键词
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A kinetic model is developed of Teflon ablation caused by a plasma. The model takes into account the returned atom flux that forms in the non-equilibrium layer during the ablation. This approach makes it possible to calculate the ablation rate for the case when the Teflon surface temperature and the density and temperature in the plasma bulk are known.
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