期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
卷 40, 期 7B, 页码 L747-L749出版社
INST PURE APPLIED PHYSICS
DOI: 10.1143/JJAP.40.L747
关键词
antireflection structured (ARS) surface; reactive ion etching (RIE); metal dotted pattern; fused silica
An antireflection surface with sub-wavelength structure has been successfully fabricated on a fused silica substrate. The fabricated antireflection structured surface consists of a microcone array of fused silica with a period shorter than the wavelengths of visible light. The microcone array is made by a reactive ion etching method using fluorocarbon plasma. A microdisk array of chromium thin film, formed by an electron-beam lithography and lift-off process, is used as the etching mask. Since an electric field induced near the substrate was focused on the edges of the metal disks, these disks gradually shrank. Consequently, a conical shape was formed. The fabricated cone array has a period of 250 urn and a height of 750 nm. Measured reflectivity of the antireflection structured surface is less than 0.5% in the wavelength range of 400-800 nm for normal incidence.
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