期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
卷 40, 期 8, 页码 4781-4784出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.40.4781
关键词
GaAs solar cell on Si substrate; defect passivation; plasma exposure; quantum efficiency
The effects of PH3/H-2 plasma exposure on GaAs grown on Si substrate (GaAs/Si) were investigated. It was found that corporation of P atoms in H-2 plasma not only hydrogenated the defect-related recombination centers of GaAs/Si epilayer, but also phosphidized the surface region of GaAs/Si epilayer by forming a phosphidized layer, Electron beam-induced current measurement directly proved that the defect-related dark spot density was effectively reduced by adding P atoms into the pure H-2 plasma. In addition, PH3/H-2 plasma exposure greatly increased the minority carrier lifetime properties and decreased the saturation current of the GaAs p(+)-n junction structure grown on Si substrate.
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