期刊
出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S0168-9002(01)01070-1
关键词
synchrotron radiation diffraction; thin film structure; boron carbonitride
Diffraction of synchrotron radiation (SR) was used to investigate crystalline structure and phase composition of thin films (1500-5000 Angstrom) of boron carbonitride. These films were synthesized by plasma-enhanced chemical vapor deposition using nontraditional volatile single source precursor trimethylamine borane complex (CH3)(3)N . BH3 and its mixture with ammonia. The effect of the gas ratio and substrate temperature on chemical and phase composition as well as the structure of the films were investigated. The XRD peculiarities of texture films and ways of increasing sensibility of measurements were considered. A possibility of the information density rise of the thin film XRD was shown due to application of different methods for recording diffraction patterns. (C) 2001 Elsevier Science B.V. All rights reserved.
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