期刊
JOURNAL OF MATERIALS RESEARCH
卷 16, 期 11, 页码 3246-3253出版社
CAMBRIDGE UNIV PRESS
DOI: 10.1557/JMR.2001.0447
关键词
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Microstructures of well-aligned multiwall carbon nanotubes grown on patterned nickel nanodots and uniform thin films by plasma-enhanced chemical vapor deposition have been studied by electron microscopy. It was found that growth of carbon nanotubes on patterned nickel nanodots and uniform thin films is different. During growth of carbon nanotubes, a nickel particle sits at the tip of each nanotube, and its [220] is preferentially oriented along the plasma direction, which can be explained by a channeling effect of ions coming into nickel particles in plasma. The alignment of nanotubes is induced by the electrical field direction relative to substrate surface.
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