Quartz crystal microbalance (QCM) is a very powerful method for in situ monitoring of thin film growth processes. However, especially at high temperatures, QCM is very sensitive to already minor temperature changes during the measurement. Here, a method for compensating the temperature effects on the QCM is introduced. In this method, the baseline drift during the growth is calculated using a function obtained by fitting the signal measured before and after the growth. The present method is compared with the earlier published reference crystal method where two closely spaced quartz crystals are used, one being protected against film growth and thus serving as a reference crystal for compensating the temperature effects on the measurement crystal. Both methods were tested with TiO2 and Al2O3 atomic layer deposition processes and the temperature effect was successfully compensated. The differences between these methods are discussed. (C) 2002 American Institute of Physics.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据