Chemical vapor deposition of 6CuO•Cu2O films on fiberglass

To coat fiberglass with copper oxides, in particular with the paramelaconite structure 6CuO-Cu2O, we have used the chemical vapor deposition (CVD) procedure of a copper precursor. The deposition of:copper oxides was done using a horizontal-flow reactor, 2,4-pentanedionate copper(II) as precursor and O-2 as carrier-reactant gas at several deposition temperatures. In order to establish a correlation between experimental parameters and the resulting copper species, as well as film quality, the samples that were produced, were evaluated using techniques such as X-ray diffraction (XRD), visible spectrophotometry, scanning electronic microscopy (SEM) and atomic force microscopy (AFM). The most important result is that 6CuO(.)Cu(2)O thin films are obtained over a short range of deposition temperatures. The film growth of this copper phase occurred in the [202] and [004] directions. (C) 2002 Elsevier Science B.V. All rights reserved.