The electroformed metal-insulator-metal structure: a comprehensive model

A new model is presented of the electroformed rnetal-insulator-metal structure which explains its various properties including electron emission, electroluminescence. memory effects and, for the first time, a complete account of the differential negative resistance. The model is based upon experiments which identify the conduction process to be trap-controlled thermally activated tunnelling between metal islands produced in the forming process. The implications for the production of commercial electroformed devices are discussed.