期刊
APPLIED PHYSICS LETTERS
卷 80, 期 16, 页码 2889-2891出版社
AMER INST PHYSICS
DOI: 10.1063/1.1473694
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We studied the epitaxy of 10 mol % Nb:SrTiO3 on a SrTiO3(100) substrate under an interrupted pulsed-laser-deposition condition. By monitoring the recovery behaviors of reflection high-energy electron diffraction intensity and an optical reflectance difference signal from the growth surface, we observed that, at temperatures above 630 degreesC, the oxidation of an as-deposited Nb:SrTiO3 monolayer was achieved by the diffusion of oxygen vacancies in the monolayer into the substrate. (C) 2002 American Institute of Physics.
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