4.6 Article

A capacitorless double-gate DRAM cell

期刊

IEEE ELECTRON DEVICE LETTERS
卷 23, 期 6, 页码 345-347

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2002.1004230

关键词

double-gate MOSFETs; fully depleted; silicon-on-insulator (SOI) MOSFETs; scaled CMOS; DRAM

向作者/读者索取更多资源

A capacitorless double-gate DRAM (DG-DRAM) cell is proposed in this study. Its dual gates and thin body reduce off-state leakage and disturb problems. Dopant fluctuations, which can be particularly important in high-density arrays, are avoided by using a thin, lightly doped body. The cell's large body coefficient ((dV(T))/(dV(BS))) transforms small gains of body potential into increased drain current. MEDICI simulations for 85degreesC show that a DG-DRAM cell may sustain a measurable change in drain current several hundred milliseconds after programming. These characteristics suggest that a thin body, double-gate cell is an interesting candidate for high density DRAM technologies.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据