4.6 Article

Multi-tip cones induced by ion-bombardment

期刊

VACUUM
卷 66, 期 1, 页码 71-76

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/S0042-207X(01)00474-2

关键词

nanoscale tips; ion beam; field emission

向作者/读者索取更多资源

Arrays of multi-tip silicon cones covering large areas of Si(100) substrates were fabricated using argon ion beam bombardment and nickel as a seeding material. Each cone head split into a number of needle tips with a lateral size of tens of nanometers. The morphology of the cones was studied with scanning electron microscopy (SEM). The transmission electron microscopy (TEM) analysis revealed nickel constituents on the needle tips. In terms of experimental observation the formation mechanism of the multi-tip cones was discussed. Studying the field electron emission properties of fabricated silicon multi-tips showed a turn-on field to be about 25 V/mum. (C) 2002 Published by Elsevier Science Ltd.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据