期刊
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
卷 8, 期 4, 页码 919-927出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JSTQE.2002.801736
关键词
optical device fabrication; optical diffraction; optical planar waveguide components; photonic crystals
Deep etching methods applied to semiconductors allow the fabrication of two-dimensional and three-dimensional photonic crystals. The use of chemical, plasma, and focused ion beam etch applied to silicon is reviewed.
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