期刊
MICROELECTRONIC ENGINEERING
卷 61-2, 期 -, 页码 901-906出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S0167-9317(02)00482-3
关键词
PDMS; XPS; pattern roughness; bilayer lithography
Surface modification of polydimethylsiloxane (PDMS) under O-2 plasma exposure is studied by XPS and real time ellipsometry. Results show the conversion of the PDMS surface into a SiOx-like material. Total layer thickness and extension of the SiOx layer are controlled by the sample bias. We suggest that surface and line edge roughness defects occurring when using PDMS as top layer in bilayer lithography are intimately related to the rapid kinetics of conversion and to the formation of SiOx hard micromasks on the surface. (C) 2002 Elsevier Science B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据