Reflectometry studies of the oxidation kinetics of thin copper films

Oxide formation on magnetron-sputtered thin copper films (35 nm thickness) was studied by x-ray reflectometry and grazing incidence x-ray diffraction. The films were oxidized in air at temperatures of 175degreesC, 200degreesC, 225degreesC and 250degreesC. The reflectometry and the diffractometry data indicate the formation of Cu2O. A power-law dependence of the oxide layer thickness was found. The activation energy obtained is weakly time dependent. Copyright (C) 2002 John Wiley Sons, Ltd.