期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 20, 期 6, 页码 2617-2621出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.1520563
关键词
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We demonstrate a versatile interference lithography system that can continuously vary the pattern period and orientation during fabrication of general periodic structures in one or two dimensions. Initial experimental results, using closed-loop beam steering control and double exposures on a stationary substrate, are obtained in order to illustrate its principle of operation. A fringe-locking scheme for phase control is also demonstrated including discussion of issues related to future system developments. (C) 2002 American Vacuum Society.
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