4.6 Article

Large area, ultra-high voltage 4H-SiC p-i-n rectifiers

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 49, 期 12, 页码 2308-2316

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2002.805576

关键词

p-i-n; rectifier; reverse recovery; SiC

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This paper reports the design, fabrication and high temperature characteristics of 1 mm(2), 4 mm(2) and 9 mm(2). 4H-SiC p-i-n rectifiers with 6 kV, 5 kV, and 10 kV blocking voltage, respectively. These results were obtained from two lots in an effort to increase the total power levels on such rectifiers. An innovative design utilizing a highly doped p-type epitaxial Anode layer and junction termination extension (JTE) were used in order to realize good on-state as well as stable blocking characteristics. For the 1 mm(2) and 4 mm(2) rectifier, a forward voltage drop of lessthan 5 V was observed at 500 A/cm(2) and the peak reverse recovery current shows a modest 50% increase in the 25 degreesC to 225 degreesC temperature range. On the 10 kV, 9 mm(2) rectifier, a forward voltage drop of less than 4.8 V was observed at 100 A/cm(2) in the entire 25 degreesC to 200 degreesC temperature range. For this device, the reverse recovery characteristics show a modest 110% increase in the peak reverse recovery current from 25 degreesC to 200 degreesC. A dramatically low Q(rr) Of 3.8 muC was obtained at a forward current density of 220 A/cm(2) at 200 degreesC for this ultra high voltage rectifier. These devices show that more than three orders of magnitude reduction in reverse recovery charge is obtained in 4H-SiC rectifiers as compared to comparable Si rectifiers.

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