期刊
APPLIED SURFACE SCIENCE
卷 203, 期 -, 页码 500-503出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S0169-4332(02)00765-1
关键词
charge compensation; SiGe; ultra shallow SIMS profiling
In this paper we demonstrate the use of red laser illumination to stimulate charge carriers in semiconductor layers with very low residual carrier densities, to eliminate surface potential changes during SIMS depth profiling. We show that very simple quantification protocols can be used for Ge assay, at least up to Ge fractions of 30%. (C) 2002 Elsevier Science B.V. All rights reserved.
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