期刊
ELECTROCHEMICAL AND SOLID STATE LETTERS
卷 6, 期 2, 页码 C21-C25出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.1535753
关键词
-
An electrochemical procedure is described for the anodic deposition of CuO thin films from solution precursors at 25-30 degreesC in an alkaline medium (pH > 13). The deposition bath was similar to Fehling's solution using tartrate ions as a complexing agent for Cu(II). Cupric oxide deposited onto a platinum substrate at an anodic current density of 5 mA cm(-2) has a preferred orientation of [010]. Rietveld refinement of the powder diffraction pattern reveals pure Cu(II) oxide with no trace of other copper oxides. The suggested mechanism involves the irreversible electrochemical oxidation of the tartrate ligand of the Cu(II) complex leading to the CuO precipitation. The same bath can also be used to deposit Cu2O films using a cathodic electrodeposition process. In this case, cuprous oxide deposited onto a platinum electrode has a [111] preferred orientation. (C) 2002 The Electrochemical Society.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据