期刊
THIN SOLID FILMS
卷 426, 期 1-2, 页码 258-264出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(02)01289-0
关键词
diamond-like carbon film; electrochemical behavior; impedance; sputtering; H2SO4 solution
Diamond-like carbon (DLC) films with different structure were deposited on highly electrically conductive silicon substrates (SiO2/Si), using d.c. magnetron sputtering deposition process. Their structure and electrochemical behavior in a 0.5 M H2SO4 solution were studied with micro-Raman spectroscopy, electrochemical impedance spectroscopic analysis and film impedance spectroscopy The combined polarization resistance of silicon coated with DLC film increased to approximately 10(6)-10(8) Omega cm(2), while the combined capacitance decreased to 10(-7)-10(-8) F cm(-2). The double layer capacitance on the DLC films was approximately 0.571-3.91 X 10(-6) F cm(-2), which was smaller than that of popular electrode materials (graphite, platinum and mercury) and comparable with that of diamond. The double layer capacitance increased with the increased Raman spectrum intensity ratio I-D/I-G and accelerated at approximately I-D/I-G = 2.25. These results suggest that the DLC films be good insulating and corrosion protection coatings in sulfuric acid and potential electrode materials for electrochemical analysis. (C) 2002 Elsevier Science B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据