期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 21, 期 2, 页码 763-766出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.1556397
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Large-area monodomain. porous alumina arrays with an interpore distance of 500 nm are fabricated by imprint lithography. A 4 in. imprint master fully compatible with silicon technology was developed, which allows imprint pressures as low as 5 kN/cm(2) for direct imprint on aluminum. Due to the self-ordering phenomenon of porous alumina growth, we were able to reduce the interpore distance of the pore array to 60% of the lattice constant of the master stamp. Three lithographically defined pores are sufficient to guide anodization of a new pore in the center. (C) 2003 American Vacuum Society.
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