期刊
ULTRAMICROSCOPY
卷 95, 期 1-4, 页码 183-188出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S0304-3991(02)00315-7
关键词
gas field ion sources; FIB
类别
A new approach to gas field ion sources is described. It is based on a structure made by inserting a field emission tip inside a small diameter tube. The tube supplies gas to the tip from a high-pressure chamber into a high-vacuum chamber where ionization takes place. Comparison of projection electron and ion micrographs shows that ionization results from a field ionization process taking place at the very end of the tip. Emission currents in the 10 nA range, for a few kV emission voltages, are obtained with various gases including neon, air and hydrogen. Lifetime experiments with H-2 show stable emission for days. (C) 2002 Elsevier Science B.V. All rights reserved.
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