Lithographic applications of highly metallized polyferrocenylsilanes

Organometallic polymers are excellent candidates for the introduction of metals into nanostructures using lithographic techniques due to their inherently high and uniform metal loadings and processibility. Soluble, high molecular weight polyferrocenylsilanes possess unique physical properties and function as excellent ceramic precusors. Recent advances in the use of lithographic techniques With a highly metallized PFS resist to form new nanopatterned materials will be presented.