Thermal desorption behavior of AlF3 formed on Al2O3

Thermal desorption behaviors of the AlF3 layer formed on Al2O3 in the sample temperature range from T-s = 300 to 930 K have been studied using molecular beam mass spectrometry combined with a time-of-flight (TOF) technique. Fluorine atoms were detected as the desorbed species at sample temperatures of T-s = 625 to 850 K and the intensity was found to be peaked at T-s = 750 K. AlF2 species whose translational temperature T-tr is approximately 100 K lower than T-s were also detected as desorbed species above T-s = 850 K and the intensity increased exponentially as T-s was raised. Based on these results, the desorption behavior of AlF3 species is discussed. [DOI: 10.1143/JJAP.42.L680].