Ruthenium oxide nanotube arrays fabricated by atomic layer deposition using a carbon nanotube template

A chemical vapor deposition-related method (atomic layer deposition) is reported to have been successfully used to fabricate an inorganic nanotube array at low temperatures (below 400 degreesC) for the first time. The Figure shows a scanning electron microscopy image of a ruthenium oxide nanotube array on top of an anodic aluminum oxide (AAO) matrix on a silicon wafer after removal of the carbon nanotube template.