Size- and shape-controlled fabrication of large-area periodic nanopillar arrays

A simple process for the fabrication of large-area well-ordered periodic nanopillar arrays have been developed based on a combination of colloidal lithography and etching techniques. Large-area nanopillar arrays have been successfully fabricated by this approach. The lateral dimensions of nanopillars as small as 40 nm and the aspect ratio as high as 7:1 have been achieved. Our results indicate that it is possible to control the size, shape, and height of nanopillar arrays by fine-tuning the etching recipes. These periodic nanopillar arrays can be used as stamps for nanoimprinting lithography and contact printing lithography to produce more complex periodic nanostructures.