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Quantum interference in a one-dimensional silicon nanowire

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PHYSICAL REVIEW B
卷 68, 期 7, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.68.075311

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We study electronic transport within a lithographically defined silicon nanowire for zero and finite bias. The 10-nm wide and 500-nm long nanowire is fabricated by advanced electron-beam lithographic techniques. Transport experiments reveal clear quantum size effects in the conduction through the wire. Energy quantization within the wire leads to a shift in conduction threshold. Quantum interference effects cause an oscillatory pattern in the conductance. At low source-drain bias, transport is dominated by shallow tunneling barriers. At higher bias, additional nanowire modes are found to contribute to the conductance.

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