期刊
ULTRAMICROSCOPY
卷 96, 期 3-4, 页码 361-365出版社
ELSEVIER
DOI: 10.1016/S0304-3991(03)00101-3
关键词
convergent-beam electron diffraction; quantitative HREM; phonon scattering; diffuse scattering; lattice images; energy filtering
类别
The amount of phonon scattering as a function of specimen thickness is determined for a clean silicon sample, free from amorphous surface layers, by measuring the diffuse scattering in energy-filtered convergent-beam diffraction patterns. It is found that for a 25 nm thick sample, only 7.5% of the intensity scattered to less than 18 nm(-1) is phonon scattered. This means that in a typical high-resolution sample most of the diffuse scattering is caused by surface amorphous layers rather than phonon scattering. (C) 2003 Elsevier Science B.V. All rights reserved.
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