期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
卷 21, 期 5, 页码 S117-S128出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.1601610
关键词
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Atomic-scale control and manipulation of the microstructure of polycrystalline thin films during kinetically limited low-temperature deposition, crucial for a broad range of industrial applications, has been a leading goal of materials science during the past decades. Here, we review the present understanding of film growth processes-nucleation, coalescence, competitive grain growth, and recrystallization-and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth. (C) 2003 American Vacuum Society.
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