4.6 Article

Simulation of island behavior in discontinuous film growth

期刊

VACUUM
卷 72, 期 2, 页码 205-210

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PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2003.08.004

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thin film; coalescence; surface diffusion; adatom

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The island behavior during discontinuous film formation was modeled by numerical simulation. Several experimentally found phenomena were simulated, namely dissolution of big islands, displacement of islands during growth in non-uniform diffusion field, coalescence and induced dissolution of islands. The results obtained show that the above phenomena can be in principle described in terms of a continuous model that simulates growth of islands in a non-uniform field of the adsorbed atoms. (C) 2003 Elsevier Ltd. All rights reserved.

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