Mononuclear mixed β-ketoester-alkoxide compound of titanium as a promising precursor for low-temperature MOCVD of TiO2 thin films

CHEMICAL VAPOR DEPOSITION

卷 9, 期 6, 页码 295-298

WILEY-V C H VERLAG GMBH

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Electrochemistry Materials Science, Coatings & Films Physics, Condensed Matter