期刊
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
卷 143, 期 -, 页码 326-331出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/S0924-0136(03)00436-9
关键词
molybdenum; sputtering; evaporation; X-ray diffraction; optical reflectance; roughness
Two different deposition techniques have been compared for obtaining large area Mo thin films as electrical back contacts in polycrystalline solar cells. The dc-magnetron sputtered layers have been made by varying dc-power (100-400 W), sputtering time (40-80 min) and Ar-mass flow rate (11-150 sccm) while e-beam evaporated Mo has been fabricated at several powers (1400-2000 W). Adequate optoelectronic, structural and morphological properties without stress have been achieved when intermediate Ar-mass flow rates are used during the sputtering process. Evaporated samples present higher electrical resistivity than sputtered ones but still valid for photovoltaic purposes. The 500-550degreesC heat treatments in Se atmosphere modify Mo features by an appearing MoO2 layer on its surface. (C) 2003 Elsevier Science B.V. All rights reserved.
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