期刊
JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 37, 期 4, 页码 588-594出版社
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/37/4/010
关键词
-
The growth of plasma deposited organic films in general is non-homogeneous, i.e. the films can consist of several layers: substrate-film interface and cross-linked bulk plasma polymer. The fourier transform infrared spectroscopy study shows evidence for a substrate-film interface layer that appears to be formed during a gas conversion in a discharge. The reflection-absorption spectroscopy and evanescent wave spectroscopy techniques have been used to analyse the evolution of molecular structure of the films growing in hexamethyldisiloxane (HMDSO) plasmas of a low pressure capacitive rf (13.56 MHz) discharge. The pulsed operation mode of the rf discharge was used in order to provide successive steps of the HMDSO plasnia-chernicai conversion into stable neutral products, which were monitored by mass spectrometry. The HMDSO conversion exerts influences on the film deposition resulting in a gradient in the molecular structure of the growing films. The comparison of the film growth on Substrates at floating and rf self-bias potentials shows that ions control the deposition kinetics and influence the molecular structure of films.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据